• 1,3-Divinyl-1,1,3,3-tetramethyldisilazane

    Linear disilazane with a vinyl group on each terminal silicon. The silicon-nitrogen backbone reacts readily with moisture, releasing ammonia, and the compound is used mainly as a silica filler surface modifier and as a vinyl-functional building block in silicone rubber, resin and gel manufacture.

  • Iodotrimethylsilane (TMSI)

    Silylating reagent, not a coupling agent or crosslinker. A strong Lewis acid and iodide source that cleaves ethers, esters, acetals and carbamates, and installs trimethylsilyl protecting groups in organic synthesis.

  • Bromotrimethylsilane (TMSBr)

    Silylating reagent, not a coupling agent or crosslinker. Milder and more selective than the iodide analog for cleaving lactones, epoxides, acetals and phosphonate esters, and for protecting hydroxyl groups in synthesis.

  • Hexamethyldisilazane (HMDS)

    Silylating reagent, not a coupling agent or crosslinker. Reacts with hydroxyl and other active-hydrogen groups to install trimethylsilyl protecting groups, releasing ammonia. Used to render fumed silica and other mineral fillers hydrophobic, and as a surface-priming agent in semiconductor photolithography.

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